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Beilstein J. Nanotechnol. 2018, 9, 842–849, doi:10.3762/bjnano.9.78
Figure 1: Scanning electron micrographs of deposits from (a, e) AgO2Me2Bu and (b, f) AgO2F5Prop using a beam ...
Figure 2: Dwell-time series for a beam current of 150 pA using (a) AgO2Me2Bu and (b) AgO2F5Prop as precursor ...
Figure 3: Scanning electron micrographs of single silver pillars obtained after continuous spot irradiation f...
Beilstein J. Nanotechnol. 2018, 9, 224–232, doi:10.3762/bjnano.9.24
Figure 1: Scanning electron micrographs of deposits from AgO2CC2F5 on bulk 200 nm SiO2/Si using a 25 keV/0.25...
Figure 2: SEM images of box deposits with the same electron dose of 7.44 nC/µm2 but different dwell and refre...
Figure 3: Images of a line deposit on a carbon membrane. (a) Scanning electron micrograph of the line deposit...
Figure 4: Dark field scanning transmission electron micrographs of the line deposit. (a) Overview image of th...
Figure 5: LineTV: FEBID line connecting four gold electrodes for four point probe measurements on bulk SiO2/S...
Figure 6: Transmission electron micrographs of the carbon membrane after deposition. (a) Typical dark field S...
Beilstein J. Nanotechnol. 2018, 9, 91–101, doi:10.3762/bjnano.9.11
Figure 1: Optical microscopy images showing the 200 nm SiO2/Si substrate and gold electrodes together with (a...
Figure 2: SEM-based average diameters of Co, Cu and Au FEBID agglomerates as function of the annealing temper...
Figure 3: Top: Raman spectra in the carbon range as a function of the post-growth annealing temperature of (a...
Figure 4: Electrical resistivities of Co–C, Cu–C and Au–C FEBID materials as a function of the annealing temp...
Figure 5: (a) Time-evolution of the electrical resistance during annealing in a 200 ppm H2 atmosphere, reveal...